Distortion of Ultrathin Photocleavable Block Copolymer Films during Photocleavage and Nanopore Formation.

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作者： Sedakat,Altinpinar ^[1] ; Hui,Zhao ^[1] ; Wael,Ali ^[2] ; Ralf S,Kappes ^[1] ; Patrick,Schuchardt ^[2] ; Sahar,Salehi ^[2] ; Gonzalo,Santoro ^[3] ; Patrick,Theato ^[4] ; Stephan V,Roth ^[4] ; Jochen S,Gutmann ^[1]

作者单位： †Institute for Physical Chemistry, University of Duisburg-Essen, Universitätsstrasse 2, 45141 Essen, Germany. ^[1] §Deutsches Textilforschungszentrum Nord-West gGmbH, Adlerstraße 1, 47798 Krefeld, Germany. ^[2] ∥WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, 980-8577 Sendai, Japan. ^[3] ⊥Photon Science, DESY, Notkestr. 85, 22607 Hamburg, Germany. ^[4] #CENIDE, University of Duisburg-Essen, Carl-Benz-Strasse 199, 47057 Duisburg, Germany. ^[5]

DOI 10.1021/acs.langmuir.5b00750

PMID 26161944

发布时间 2015-08-18

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Langmuir

2015年31卷32期

8947-52页

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Distortion of Ultrathin Photocleavable Block Copolymer Films during Photocleavage and Nanopore Formation.

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Distortion of Ultrathin Photocleavable Block Copolymer Films during Photocleavage and Nanopore Formation.

Langmuir

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Langmuir

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