Atomic Layer Deposition from Dissolved Precursors.

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作者： Yanlin,Wu ^[1] ; Dirk,Döhler ^[1] ; Maïssa,Barr ^[2] ; Elina,Oks ^[3] ; Marc,Wolf ^[3] ; Lionel,Santinacci ^[2] ; Julien,Bachmann ^[1]

作者单位： Department of Chemistry and Pharmacy, Friedrich-Alexander University of Erlangen-Nürnberg , Egerlandstrasse 1, D-91058 Erlangen, Germany. ^[1] CNRS, CINaM UMR 7325, Aix Marseille Université , F-13288 Marseille, France. ^[2] Departments of Chemistry and Physics, University of Hamburg , Sedanstrasse 19, D-20146 Hamburg, Germany. ^[3]

关键词 Atomic layer deposition LBL SILAR magnesium oxide microfluidic thin films

DOI 10.1021/acs.nanolett.5b01424

PMID 26418724

发布时间 2020-09-30

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