Robust, Uniform, and Highly Emissive Quantum Dot-Polymer Films and Patterns Using Thiol-Ene Chemistry.

导出 LinkOut

翻译打印收藏纠错

作者： Marcus J,Smith ^[1] ; Sidney T,Malak ^[2] ; Jaehan,Jung ^[1] ; Young Jun,Yoon ^[1] ; Chun Hao,Lin ^[3] ; Sunghan,Kim ^[1] ; Kyung Min,Lee ^[1] ; Ruilong,Ma ^[1] ; Timothy J,White ^[2] ; Timothy J,Bunning ^[1] ; Zhiqun,Lin ^[2] ; Vladimir V,Tsukruk ^[2]

作者单位： School of Materials Science and Engineering, Georgia Institute of Technology , Atlanta, Georgia 30332, United States. ^[1] Air Force Research Laboratories, Wright-Patterson Air Force Base, Ohio 45433, United States. ^[2] Department of Materials Science and Engineering, Hongik University , Sejong 339-701, South Korea. ^[3]

关键词 photoluminescence polymer nanocomposite quantum dots quantum yield soft lithography thiol?ene thiol?ene chemistry

DOI 10.1021/acsami.7b03366

PMID 28441503

发布时间 2018-07-30

翻译满意度评价：

准确一般字义偏差语意偏离译文作用小提交