Self-Collapse Lithography.

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作者： Chuanzhen,Zhao ^[1] ; Xiaobin,Xu ^[2] ; Qing,Yang ^[1] ; Tianxing,Man ^[2] ; Steven J,Jonas ^[1] ; Jeffrey J,Schwartz ^[2] ; Anne M,Andrews ^[3] ; Paul S,Weiss ^[4]

作者单位： California NanoSystems Institute, University of California, Los Angeles , Los Angeles, California 90095, United States. ^[1] Department of Chemistry and Biochemistry, University of California, Los Angeles , Los Angeles, California 90095, United States. ^[2] Department of Mechanical and Aerospace Engineering, University of California, Los Angeles , Los Angeles, California 90095, United States. ^[3] Department of Pediatrics, David Geffen School of Medicine, University of California Los Angeles , Los Angeles, California 90095, United States. ^[4] Eli & Edythe Broad Center of Regenerative Medicine and Stem Cell Research, University of California, Los Angeles , Los Angeles, California 90095, United States. ^[5] Children's Discovery and Innovation Institute, University of California, Los Angeles , Los Angeles, California 90095, United States. ^[6] Department of Physics and Astronomy, University of California, Los Angeles , Los Angeles, California 90095, United States. ^[7] Department of Psychiatry and Biobehavioral Sciences, Semel Institute for Neuroscience and Human Behavior, and Hatos Center for Neuropharmacology, University of California, Los Angeles , Los Angeles, California 90095, United States. ^[8] Department of Materials Science and Engineering, University of California, Los Angeles , Los Angeles, California 90095, United States. ^[9]

关键词 Chemical lift-off lithography nanolithography self-collapse soft lithography

DOI 10.1021/acs.nanolett.7b02269

PMID 28737930

发布时间 2020-09-30

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