Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process.

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作者： Laixi,Sun ^[1] ; Ting,Shao ^[2] ; Zhaohua,Shi ^[3] ; Jin,Huang ^[4] ; Xin,Ye ^[5] ; Xiaodong,Jiang ^[6] ; Weidong,Wu ^[7] ; Liming,Yang ^[8] ; Wanguo,Zheng ^[9]

作者单位： Research Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China. sunlaixi@yahoo.com. ^[1] Research Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China. shaotingcaep@163.com. ^[2] Research Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China. shizhaohuacaep@163.com. ^[3] Research Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China. huanjingzz@yeah.net. ^[4] Research Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China. yexin@caep.com. ^[5] Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China. jiangxiaodongzr@163.com. ^[6] IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China. wuweidonging@163.com. ^[7] Research Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China. yanglimingzs@163.com. ^[8] IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China. zhengwanguosz@163.com. ^[9]

关键词 contamination fused silica laser damage optical performance reactive ion etching

DOI 10.3390/ma11040577

PMID 29642571

发布时间 2020-09-29

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