Reversible Oxidative Addition/Reductive Elimination of a Si-H Bond with Base-Stabilized Silylenes: A Theoretical Insight.

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作者： Masayuku,Nakagaki ^[1] ; Antoine,Baceiredo ^[2] ; Tsuyoshi,Kato ^[2] ; Shigeyoshi,Sakaki ^[1]

作者单位： Fukui Institute for Fundamental Chemistry, Kyoto University, Takano-Nishi-hiraki-cho 34-4, Sakyo-ku, Kyoto, 606-8103, Japan. ^[1] Université de Toulouse, UPS, and CNRS, LHFA UMR 5069, F-31062, Toulouse, France. ^[2]

关键词 density functional calculations hypervalent oxidative addition reaction mechanisms silicon

DOI 10.1002/chem.201801369

PMID 29786915

发布时间 2018-08-22

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Chemistry (Weinheim an der Bergstrasse, Germany)

2018年24卷44期

11377-11385页

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Reversible Oxidative Addition/Reductive Elimination of a Si-H Bond with Base-Stabilized Silylenes: A Theoretical Insight.

Chemistry (Weinheim an der Bergstrasse, Germany)

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Chemistry (Weinheim an der Bergstrasse, Germany)

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Reversible Oxidative Addition/Reductive Elimination of a Si-H Bond with Base-Stabilized Silylenes: A Theoretical Insight.

Chemistry (Weinheim an der Bergstrasse, Germany)

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Chemistry (Weinheim an der Bergstrasse, Germany)

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