第一单位：
Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA.;School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, 200240, Shanghai, China.
作者：
Zhipeng,Li [1]
;
Tianmeng,Wang [2]
;
Chenhao,Jin [3]
;
Zhengguang,Lu [4]
;
Zhen,Lian [2]
;
Yuze,Meng [5]
;
Mark,Blei [6]
;
Shiyuan,Gao [7]
;
Takashi,Taniguchi [8]
;
Kenji,Watanabe [8]
;
Tianhui,Ren [9]
;
Sefaattin,Tongay [6]
;
Li,Yang [7]
;
Dmitry,Smirnov [10]
;
Ting,Cao [11]
;
Su-Fei,Shi [12]
作者单位：
Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA.;School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, 200240, Shanghai, China.
[1]
Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA.
[2]
Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, 14853, USA.
[3]
National High Magnetic Field Lab, Tallahassee, FL, 32310, USA.;Department of Physics, Florida State University, Tallahassee, FL, 32306, USA.
[4]
Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA.;College of Physics, Nanjing University, 210093, Nanjing, China.
[5]
School for Engineering of Matter, Transport and Energy, Arizona State University, Tempe, AZ, 85287, USA.
[6]
Department of Physics, Washington University in St. Louis, St. Louis, MO, 63136, USA.
[7]
National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan.
[8]
School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, 200240, Shanghai, China. thren@sjtu.edu.cn.
[9]
National High Magnetic Field Lab, Tallahassee, FL, 32310, USA.
[10]
Geballe Laboratory for Advanced Materials, Stanford University, Stanford, CA, 94305, USA. tingcao@uw.edu.;Department of Materials Science and Engineering, University of Washington, Seattle, WA, 98195, USA. tingcao@uw.edu.
[11]
Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA. shis2@rpi.edu.;Department of Electrical, Computer & Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA. shis2@rpi.edu.
[12]
DOI
10.1038/s41467-019-10477-6
PMID
31171789
发布时间
2023-10-12
换一批
