Highly Selective Photoreduction of CO<sub>2</sub> with Suppressing H<sub>2</sub> Evolution over Monolayer Layered Double Hydroxide under Irradiation above 600 nm.
第一作者:
Ling,Tan
第一单位:
State Key Laboratory of Chemical Resource Engineering, Beijing Advanced Innovation Centre for Soft Matter Science and Engineering, Beijing University of Chemical Technology, Beijing, 100029, P. R. China.
作者:
DOI
10.1002/anie.201904246
PMID
31183943
发布时间
2019-09-23
- 浏览0
相似文献
- 中文期刊
- 外文期刊
- 学位论文
- 会议论文


换一批



