Epoxy Resins for Negative Tone Photoresists.

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作者： Vitor,Vlnieska ^[1] ; Andrey,Mikhaylov ^[2] ; Margarita,Zakharova ^[3] ; Eva,Blasco ^[3] ; Danays,Kunka ^[4]

作者单位： Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany. vitor.vlnieska@kit.edu. ^[1] Federal University of Paraná, Chemistry Department, Rua Coronel Francisco Heráclito dos Santos, 100, Jardim das Américas, Curitiba 81531-980, PR, Brazil. vitor.vlnieska@kit.edu. ^[2] Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany. ^[3] Karlsruhe Institute of Technology (KIT), Institute for Chemical Technology and Polymer Chemistry (ITCP), Engesserstr. 18, 76131 Karlsruhe, Germany. ^[4]

关键词 DSC ESI-μ-TOF-MS RMN SEM-EDX deep X-ray lithography (DXRL)deep ultraviolet lithography (DUVL)lithography

DOI 10.3390/polym11091457

PMID 31500104

发布时间 2020-10-01

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