From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications.

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作者： Lukas,Mai ^[1] ; Felix,Mitschker ^[2] ; Claudia,Bock ^[3] ; Alessia,Niesen ^[4] ; Engin,Ciftyurek ^[5] ; Detlef,Rogalla ^[6] ; Johannes,Mickler ^[4] ; Matthias,Erig ^[4] ; Zheshen,Li ^[7] ; Peter,Awakowicz ^[2] ; Klaus,Schierbaum ^[5] ; Anjana,Devi ^[1]

作者单位： Inorganic Materials Chemistry, Ruhr University Bochum, Universitätsstr. 150, Bochum, 44801, Germany. ^[1] Institute of Electrical Engineering and Plasma Technology, Ruhr University Bochum, Universitätsstr. 150, Bochum, 44801, Germany. ^[2] Microsystems Technology, Ruhr University Bochum, Universitätsstr. 150, Bochum, 44801, Germany. ^[3] Forschung und Entwicklung, GB Sensorik, paragon GmbH & Co KGaA, Schwalbenweg 29, Delbrück, 33129, Germany. ^[4] Department of Material Science Institute of Experimental Condensed Matter Physics, Heinrich Heine University Düsseldorf, Universitätsstr. 1, Düsseldorf, 40225, Germany. ^[5] RUBION, Ruhr University Bochum, Universitätsstr. 150, Bochum, 44801, Germany. ^[6] Department of Physics and Astronomy - Centre for Storage Ring Facilities (ISA), Aarhus University, Aarhus, 8000, Denmark. ^[7]

关键词 atomic layer deposition gas barrier layers gas sensors zinc oxide zinc precursors

DOI 10.1002/smll.201907506

PMID 32346997

发布时间 2020-06-05

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