Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl<sub>4</sub>) Precursor.

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作者： Woo-Jae,Lee ^[1] ; Eun-Young,Yun ^[1] ; Han-Bo-Ram,Lee ^[2] ; Suck Won,Hong ^[3] ; Se-Hun,Kwon ^[1]

作者单位： School of Materials Science and Engineering, Pusan National University, 30 Jangjeon-Dong Geumjeong-Gu, Busan, 609-735, Republic of Korea. ^[1] Department of Materials Science and Engineering, Incheon National University, 119 Academy-ro, Yeonsu-gu, Incheon, 22012, Republic of Korea. ^[2] Department of Cogno-Mechatronics Engineering, Department of Optics and Mechatronics Engineering, Pusan National University, 30 Jangjeon-Dong Geumjeong-Gu, Busan, 609-735, Republic of Korea. ^[3]

关键词 Plasma-Enhanced Atomic Layer Deposition (PEALD)TiN (Titanium Nitride)tetrakis(dimethylamino)titanium (TDMAT)titanium tetrachloride (TiCl4)

DOI 10.1016/j.dib.2020.105777

PMID 32551348

发布时间 2020-09-28

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2020年31卷

105777页

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Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl<sub>4</sub>) Precursor.

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Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl<sub>4</sub>) Precursor.

Data in brief

相似文献

Data in brief

相关期刊

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