Nucleation and Initial Stages of Growth during the Atomic Layer Deposition of Titanium Oxide on Mesoporous Silica.

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作者： Wang,Ke ^[1] ; Yang,Liu ^[2] ; Xuelong,Wang ^[3] ; Xiangdong,Qin ^[1] ; Limei,Chen ^[1] ; Robert M,Palomino ^[3] ; Juan Pablo,Simonovis ^[3] ; Ilkeun,Lee ^[4] ; Iradwikanari,Waluyo ^[1] ; José A,Rodriguez ^[4] ; Anatoly I,Frenkel ^[3] ; Ping,Liu ^[2] ; Francisco,Zaera ^[3]

作者单位： Department of Chemistry, University of California, Riverside, California 92521, United States. ^[1] Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794, United States. ^[2] Chemistry Division, Brookhaven National Laboratory, Upton, New York 11973, United States. ^[3] National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, United States. ^[4]

关键词 chemical film deposition growth mechanism low density mesoporous materials titania

DOI 10.1021/acs.nanolett.0c02990

PMID 32840377

发布时间 2020-09-30

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