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High-Temperature Atomic Layer Deposition of GaN on 1D Nanostructures.

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第一作者： Aaron J,Austin

第一单位： Department of Physics, Oklahoma State University, Stillwater, OK 74078-3072, USA.

作者： Aaron J,Austin ^[1] ; Elena,Echeverria ^[1] ; Phadindra,Wagle ^[1] ; Punya,Mainali ^[1] ; Derek,Meyers ^[1] ; Ashish Kumar,Gupta ^[2] ; Ritesh,Sachan ^[2] ; S,Prassana ^[3] ; David N,McIlroy ^[1]

作者单位： Department of Physics, Oklahoma State University, Stillwater, OK 74078-3072, USA. ^[1] School of Mechanical and Aerospace Engineering, Oklahoma State University, Stillwater, OK 74074-3072, USA. ^[2] Department of Physics, Oklahoma State University, Stillwater, OK 74078-3072, USA.;Center for Surface Science, Department of Physics, PSG College of Technology, Coimbatore 641004, India. ^[3]

关键词 atomic layer deposition custom ALD reactor functional coatings gallium nitride nanosprings

DOI 10.3390/nano10122434

PMID 33291493

发布时间 2020-12-26

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Nanomaterials (Basel, Switzerland)

2020年10卷12期

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Nanomaterials (Basel, Switzerland)

2020年10卷12期

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High-Temperature Atomic Layer Deposition of GaN on 1D Nanostructures.

Nanomaterials (Basel, Switzerland)

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High-Temperature Atomic Layer Deposition of GaN on 1D Nanostructures.

Nanomaterials (Basel, Switzerland)

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