Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam system.

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第一作者： Byeong-Seon,An

第一单位： School of Advanced Material Science and Engineering, Sungkyunkwan University, Suwon, 16419, Korea.

作者： Byeong-Seon,An ^[1] ; Yena,Kwon ^[1] ; Jin-Su,Oh ^[1] ; Yeon-Ju,Shin ^[2] ; Jae-Seon,Ju ^[2] ; Cheol-Woong,Yang ^[3]

作者单位： School of Advanced Material Science and Engineering, Sungkyunkwan University, Suwon, 16419, Korea. ^[1] Cooperative Center for Research Facilities, Sungkyunkwan University, Suwon, 16419, Korea. ^[2] School of Advanced Material Science and Engineering, Sungkyunkwan University, Suwon, 16419, Korea. cwyang@skku.edu. ^[3]

关键词 Electrical resistance Electron beam induced deposition Focused ion beam Ion beam induced deposition

DOI 10.1186/s42649-019-0008-2

PMID 33580325

发布时间 2021-02-15

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Applied microscopy

2019年49卷1期

6页

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Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam system.

Applied microscopy

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Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam system.

Applied microscopy

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Applied microscopy

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