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Formation of Si-Rich Interfaces by Radiation-Induced Diffusion and Microsegregation in CrN/ZrN Nanolayer Coating.

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第一作者： Alexander D,Pogrebnjak

第一单位： Sumy State University, 2, Rimsky Korsakov Street, 40007 Sumy, Ukraine.;Department of Biotechnology, Al-Farabi Kazakh National University, 050040 Almaty, Kazakhstan.

作者： Alexander D,Pogrebnjak ^[1] ; Richard F,Webster ^[2] ; Richard D,Tilley ^[2] ; Vladimir V,Buranich ^[3] ; Volodymyr I,Ivashchenko ^[4] ; Yoshihiko,Takeda ^[5] ; Keiji,Oyoshi ^[5] ; Rimma,Sakenova ^[6] ; Katarzyna,Piotrowska ^[7] ; Pawel,Zukowski ^[7] ; Piotr,Konarski ^[8] ; Anatoliy I,Kupchishin ^[9] ; Piotr,Budzynski ^[7]

作者单位： Sumy State University, 2, Rimsky Korsakov Street, 40007 Sumy, Ukraine.;Department of Biotechnology, Al-Farabi Kazakh National University, 050040 Almaty, Kazakhstan. ^[1] Electron Microscope Unit, Mark Wainwright Analytical Centre, University of New South Wales, Sydney, New South Wales 2052, Australia. ^[2] Sumy State University, 2, Rimsky Korsakov Street, 40007 Sumy, Ukraine. ^[3] Institute for Problems of Materials Science National Academy of Sciences in Ukraine, 03142 Kiev, Ukraine. ^[4] National Institute for Material Science (NIMS), 3-13 Sakura, Tsukuba, Ibaraki prefecture 305-0003, Japan. ^[5] D. Serikbayev East Kazakhstan State Technical University, 69, Protozanova Street, 070004 Ust-Kamenogorsk, Kazakhstan. ^[6] Lublin University of Technology, 36, Nadbystrzycka Street, 20-618 Lublin, Poland. ^[7] Tele and Radio Research Institute, 11, Ratuszowa Street, 03-450 Warsaw, Poland. ^[8] Abai Kazakh National Pedagogical University, pr. Dostyk 13, 050010 Almaty, Kazakhstan. ^[9]

关键词 Si ion implantation coefficient of friction interfaces microsegregation substitution energy wear resistance

DOI 10.1021/acsami.0c19451

PMID 33819009

发布时间 2021-04-15

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