Effect of OH- on chemical mechanical polishing of β-Ga2O3 (100) substrate using an alkaline slurry.

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作者： Chuanjin,Huang ^[1] ; Wenxiang,Mu ^[2] ; Hai,Zhou ^[3] ; Yongwei,Zhu ^[2] ; Xiaoming,Xu ^[1] ; Zhitai,Jia ^[2] ; Lei,Zheng ^[3] ; Xutang,Tao ^[2]

作者单位： College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics Nanjing 210016 China meeywzhu@nuaa.edu.cn. ^[1] College of Mechanical Engineering, Yancheng Institute of Technology Yancheng 224051 China. ^[2] State Key Laboratory of Crystal Materials, Key Laboratory of Functional Crystal Materials and Device, Shandong University Jinan 250100 China txt@sdu.edu.cn. ^[3]

DOI 10.1039/c7ra11570a

PMID 35540376

发布时间 2022-05-11

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RSC advances

2018年8卷12期

6544-6550页

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Effect of OH<sup>-</sup> on chemical mechanical polishing of β-Ga<sub>2</sub>O<sub>3</sub> (100) substrate using an alkaline slurry.

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Effect of OH<sup>-</sup> on chemical mechanical polishing of β-Ga<sub>2</sub>O<sub>3</sub> (100) substrate using an alkaline slurry.

RSC advances

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RSC advances

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