Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application as Locally Reactive Nanoporous Thin Films.

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第一作者： Hui,Zhao

第一单位： Institute for Technical and Macromolecular Chemistry, University of Hamburg, Bundesstr.45, 20146 Hamburg, Germany.

作者： Hui,Zhao ^[1] ; Weiyin,Gu ^[2] ; Ryohei,Kakuchi ^[1] ; Zhiwei,Sun ^[2] ; Elizabeth,Sterner ^[2] ; Thomas P,Russell ^[2] ; E Bryan,Coughlin ^[2] ; Patrick,Theato ^[1]

作者单位： Institute for Technical and Macromolecular Chemistry, University of Hamburg, Bundesstr.45, 20146 Hamburg, Germany. ^[1] Department of Polymer Science and Engineering, University of Massachusetts, 120 Governors Drive, Amherst, Massachusetts 01003-4530, United States. ^[2]

DOI 10.1021/mz400389r

PMID 35581861

发布时间 2022-05-20

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2013年2卷11期

966-969页

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Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application as Locally Reactive Nanoporous Thin Films.

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Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application as Locally Reactive Nanoporous Thin Films.

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