Frontiers in the Application of RF Vacuum Electronics.

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第一作者： Carter M,Armstrong

第一单位： L3Harris Electron Devices, Torrance, CA 90505 USA.

作者： Carter M,Armstrong ^[1] ; Emma C,Snively ^[2] ; Muhammad,Shumail ^[2] ; Christopher,Nantista ^[2] ; Zenghai,Li ^[2] ; Sami,Tantawi ^[2] ; Bill W,Loo ^[3] ; Richard J,Temkin ^[4] ; Robert G,Griffin ^[5] ; Jinjun,Feng ^[6] ; Roberto,Dionisio ^[7] ; Felix,Mentgen ^[7] ; Natanael,Ayllon ^[7] ; Mark A,Henderson ^[8] ; Timothy P,Goodman ^[9]

作者单位： L3Harris Electron Devices, Torrance, CA 90505 USA. ^[1] SLAC National Accelerator Laboratory, Menlo Park, CA 94025 USA. ^[2] Department of Radiation Oncology and Stanford Cancer Institute, Stanford University School of Medicine, Stanford, CA 94305 USA. ^[3] Department of Physics and the Plasma Science and Fusion Center, Massachusetts Institute of Technology, Cambridge, MA 02139 USA. ^[4] Department of Chemistry and the Francis Bitter Magnet Laboratory, Massachusetts Institute of Technology, Cambridge, MA 02139 USA. ^[5] Beijing Vacuum Electronics Research Institute, Beijing 100015, China. ^[6] RF Equipment and Technologies Section, European Space Agency (ESA), NL-2200 AG Noordwijk, The Netherlands. ^[7] United Kingdom Atomic Energy Authority, Culham Science Centre, OX14 3DB Abingdon, U.K. ^[8] Swiss Plasma Center, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland. ^[9]