<i>Operando</i> Characterization and Molecular Simulations Reveal the Growth Kinetics of Graphene on Liquid Copper During Chemical Vapor Deposition.

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第一作者： Valentina,Rein

第一单位： ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38043 Grenoble, France.

作者： Valentina,Rein ^[1] ; Hao,Gao ^[2] ; Hendrik H,Heenen ^[2] ; Wissal,Sghaier ^[3] ; Anastasios C,Manikas ^[4] ; Christos,Tsakonas ^[4] ; Mehdi,Saedi ^[5] ; Johannes T,Margraf ^[6] ; Costas,Galiotis ^[2] ; Gilles,Renaud ^[7] ; Oleg V,Konovalov ^[4] ; Irene M N,Groot ^[3] ; Karsten,Reuter ^[1] ; Maciej,Jankowski ^[5]

作者单位： ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38043 Grenoble, France. ^[1] Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany. ^[2] University of Grenoble Alpes and CEA, IRIG/MEM/NRS, 38000 Grenoble, France. ^[3] FORTH/ICE-HT and Department of Chemical Engineering, University of Patras, 26504 Patras, Greece. ^[4] Leiden Institute of Chemistry, Leiden University, P.O. Box 9502, 2300 RA Leiden, The Netherlands. ^[5] Physics Department, Shahid Beheshti University, Evin, Tehran, 1983969411, Iran. ^[6] University of Bayreuth, Bavarian Center for Battery Technology (BayBatt), Weiherstraße 26, 95448 Bayreuth, Germany. ^[7]

关键词 biased molecular dynamics chemical vapor deposition free energy simulations graphene growth kinetics liquid metal catalysts machine-learning potentials

DOI 10.1021/acsnano.4c02070

PMID 38688475

发布时间 2024-05-19

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