Effect of Deposition Pressure and Temperature on Tungsten Thin-Film Heater for Phase-Change Switch Applications.

导出 LinkOut

翻译打印收藏纠错

第一作者： Sheng,Qu

第一单位： School of Integrated Circuit Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, China.;State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China.

作者： Sheng,Qu ^[1] ; Jihua,Zhang ^[1] ; Libin,Gao ^[1] ; Hongwei,Chen ^[1] ; Yao,Ding ^[1]

作者单位： School of Integrated Circuit Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, China.;State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China. ^[1]

关键词 magnetron sputtering microheater phase-change switch tungsten film

DOI 10.3390/mi15050576

PMID 38793149

发布时间 2024-05-27

翻译满意度评价：

准确一般字义偏差语意偏离译文作用小提交

浏览0

Micromachines

2024年15卷5期

相似文献

中文期刊
外文期刊
学位论文
会议论文

检索历史清除

Effect of Deposition Pressure and Temperature on Tungsten Thin-Film Heater for Phase-Change Switch Applications.

Micromachines

相似文献

Micromachines

相关期刊

参考文献：
指定格式：	NoteExpress EndNote RefWorks NoteFirst

检索历史 清除

Effect of Deposition Pressure and Temperature on Tungsten Thin-Film Heater for Phase-Change Switch Applications.

Micromachines

相似文献

Micromachines

相关期刊

检索历史清除