首页> ACS applied materials & interfaces> Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions.

Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions.

导出 OA

翻译打印收藏纠错

第一作者： Quentin,Evrard

第一单位： Advanced Research Center for Nanolithography ARCNL, Science Park 106, 1098 XG Amsterdam, The Netherlands.;van't Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands.

作者： Quentin,Evrard ^[1] ; Najmeh,Sadegh ^[2] ; Simon,Mathew ^[3] ; Ed,Zuidinga ^[3] ; Benjamin,Watts ^[4] ; Maximilian,Paradiz Dominguez ^[3] ; Angelo,Giglia ^[5] ; Nicola,Mahne ^[5] ; Stefano,Nannarone ^[5] ; Akira,Nishimura ^[6] ; Tsuyoshi,Goya ^[6] ; Takuo,Sugioka ^[6] ; Michaela,Vockenhuber ^[4] ; Yasin,Ekinci ^[4] ; Albert M,Brouwer ^[1]

作者单位： Advanced Research Center for Nanolithography ARCNL, Science Park 106, 1098 XG Amsterdam, The Netherlands.;van't Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands. ^[1] Advanced Research Center for Nanolithography ARCNL, Science Park 106, 1098 XG Amsterdam, The Netherlands. ^[2] van't Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands. ^[3] Paul Scherrer Institute, Forschungsstrasse 111, 5232 Villigen PSI, Switzerland. ^[4] CNR-IOM─Istituto Officina dei Materiali, National Research Council of Italy, Strada Statale 14 km 163, 5, Basovizza, Trieste 34149, Italy. ^[5] Nippon Shokubai, 5-8 Nishi Otabi-cho, Suita, Osaka 564-0034, Japan. ^[6]

关键词 Inorganic?organic hybrid photoresist extreme ultraviolet lithography metal-based photoresist tin-based photoresist tin-oxo-hydroxo cage

DOI 10.1021/acsami.4c08636

PMID 39103240

发布时间 2024-08-21

翻译满意度评价：

准确一般字义偏差语意偏离译文作用小提交