Influence of Spectral Bandwidth on the Working Curve in Vat Photopolymerization.

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第一作者： Benjamin W,Caplins

第一单位： National Institute of Standards and Technology, 325 Broadway, Boulder, CO, 80305, United States.

作者： Benjamin W,Caplins ^[1] ; Thomas J,Kolibaba ^[1] ; Uwe,Arp ^[2] ; C Cameron,Miller ^[2] ; Yuqin,Zong ^[2] ; Dianne L,Poster ^[2] ; Callie I,Higgins ^[1] ; Jason P,Killgore ^[1]

作者单位： National Institute of Standards and Technology, 325 Broadway, Boulder, CO, 80305, United States. ^[1] National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD, 20899, United States. ^[2]

关键词 Digital Light Processing (DLP)Light Emitting Diode (LED)Masked Stereolithography (MSLA)Vat Photopolymerization Working Curve

DOI 10.1016/j.addma.2024.104172

PMID 39385972

发布时间 2024-10-11

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Influence of Spectral Bandwidth on the Working Curve in Vat Photopolymerization.

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Influence of Spectral Bandwidth on the Working Curve in Vat Photopolymerization.

Additive manufacturing

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Additive manufacturing

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