Photo-Cross-linked DNA Structures Greatly Improves Their Serum Nuclease Resistances and Gene Knock-In Efficiencies.

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第一作者： Zhigang,Li

第一单位： Hefei National Research Center for Physical Sciences at the Microscale, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, 230026, China.

作者： Zhigang,Li ^[1] ; Youwei,Ma ^[2] ; Chengxu,Li ^[3] ; Shiyan,Xiao ^[1] ; Haojun,Liang ^[1]

作者单位： Hefei National Research Center for Physical Sciences at the Microscale, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, 230026, China. ^[1] Institute of Materials, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, 1015, Switzerland. ^[2] Key Laboratory of Precision and Intelligent Chemistry, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, Anhui, 230026, China. ^[3]

关键词 cyanovinylcarbazole nucleoside (CNVK)knock‐in efficiency long ssDNA (lssDNA)resistance to exonucleases stabilization?of DNA structures

DOI 10.1002/smtd.202401346

PMID 39713911

发布时间 2024-12-23

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Photo-Cross-linked DNA Structures Greatly Improves Their Serum Nuclease Resistances and Gene Knock-In Efficiencies.

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Photo-Cross-linked DNA Structures Greatly Improves Their Serum Nuclease Resistances and Gene Knock-In Efficiencies.

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