Tape-Assisted Residual Layer-Free One-Step Nanoimprinting of High-Index Hybrid Polymer for Optical Loss-Suppressed Metasurfaces.

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作者： Yujin,Park ^[1] ; Joohoon,Kim ^[1] ; Younghwan,Yang ^[1] ; Dong Kyo,Oh ^[1] ; Hyunjung,Kang ^[1] ; Hongyoon,Kim ^[1] ; Junsuk,Rho ^[2]

作者单位： Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea. ^[1] Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.;Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.;Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.;POSCO-POSTECH-RIST Convergence Research Center for Flat Optics and Metaphotonics, Pohang, 37673, Republic of Korea.;National Institute of Nanomaterials Technology (NINT), Pohang, 37673, Republic of Korea. ^[2]

关键词 dielectric structural color metausrface hologram metasurface nanoparticle‐embedded resin residual layer removal tape‐assisted nanoimprint lithography

DOI 10.1002/advs.202409371

PMID 39778013

发布时间 2025-01-08

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Advanced science (Weinheim, Baden-Wurttemberg, Germany)

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Tape-Assisted Residual Layer-Free One-Step Nanoimprinting of High-Index Hybrid Polymer for Optical Loss-Suppressed Metasurfaces.

Advanced science (Weinheim, Baden-Wurttemberg, Germany)

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Advanced science (Weinheim, Baden-Wurttemberg, Germany)

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Tape-Assisted Residual Layer-Free One-Step Nanoimprinting of High-Index Hybrid Polymer for Optical Loss-Suppressed Metasurfaces.

Advanced science (Weinheim, Baden-Wurttemberg, Germany)

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Advanced science (Weinheim, Baden-Wurttemberg, Germany)

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