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Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates.

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第一作者： Hua,Xu

第一单位： Beijing Key Laboratory of Optoelectronic Functional Materials and Micro-nano Devices, School of Physics, Renmin University of China, Beijing 100872, China.;Key Laboratory of Quantum State Construction and Manipulation (Ministry of Education), Renmin University of China, Beijing 100872, China.

作者： Hua,Xu ^[1] ; Kai,Li ^[1] ; Zuoquan,Tan ^[1] ; Jiaqi,Jia ^[1] ; Le,Wang ^[1] ; Shanshan,Chen ^[1]

作者单位： Beijing Key Laboratory of Optoelectronic Functional Materials and Micro-nano Devices, School of Physics, Renmin University of China, Beijing 100872, China.;Key Laboratory of Quantum State Construction and Manipulation (Ministry of Education), Renmin University of China, Beijing 100872, China. ^[1]

关键词 2D materials CVD direct growth h-BN insulating substrates

DOI 10.3390/nano15141059

PMID 40711178

发布时间 2025-07-29

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2025年15卷14期

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Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates.

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Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates.

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Nanomaterials (Basel, Switzerland)

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